Semiconductor Applications
HS carbon high-purity graphite components are crucial to processes in the semiconductor industry that are suitable for use in a high-temperature and dust-free environment, we offer high-precision graphite components for wafer processing equipment, such as susceptors for Epitaxy or MOCVD.

Monocrystalline silicon

High purity graphite for Ion implant

MOCVD Susceptor

MOCVD cyclone ring

MOCVD components

Graphite fixture
Proerty | values | R-6340 | R-6500 | R-6510 | R-6650 |
Density | g/cm3 | 1.72 | 1.77 | 1.83 | 1.84 |
Porosity(Open) | % | 15 | 14 | 10 | 10 |
Grain Size |
μm |
15 | 10 | 10 | 7 |
Hradness Rockwell B 5/100 |
HRB |
80 | 70 | 90 | 95 |
Young's mouldus | Mpa | 11000 | 10500 | 11500 | 12500 |
Flexural Strength |
Mpa |
40 | 45 | 60 | 65 |
Compressive Strength |
Mpa |
85 | 90 | 130 | 150 |
Specific electrical resistance |
µΩm | 16 | 12 | 13 | 14 |
Thermal expension | x10-6K-1 | 3.2 | 4.2 | 4.2 | 4.1 |
Thermal conductivity |
Wm-1K-1 | 105 | 90 | 105 | 95 |
Ash Value |
ppm | 100 | 100 | 100 | 100 |